T3PIA Integrated High-speed Pendulum Valve and Controller – MKS

MKS T3P Pendulum Valves have been designed for the most demanding semiconductor and thin film applications. T3P valves feature wide control range and high valve speed to enable fast, precise and reliable pressure control for all etch, deposition and chamber clean process steps – including those with reduced flows or at high pressures. The ability to precisely control conductance over the entire valve stroke, including near-closed positions, enables recipe pressures to be reached quickly and with minimal overshoot. With its advanced self-tuning control, the T3P valve provides superior process stability and maximizes throughput. Combining wide dynamic range pressure control and isolation capabilities into a single unit, the T3P valve reduces cost and system complexity.

An on-board digital controller supports multiple communication protocols – including DeviceNet and RS232, adding the T3P to MKS’ portfolio of digitally controlled products. By combining the T3P with industry standard MKS Baratron® capacitance manometers, MKS provides the optimal solution for pressure measurement and process control.

The mechanical design features of the T3P include MKS’ patented CAM mechanism providing a symmetrical and linear control and a space-saving low profile design. A simple operating mechanism featuring a minimal number of moving parts and fewer wetted stainless steel parts, provides virtually particle-free operation.

Obsolete product with no direct replacement from MKS.  Contact CCR for alternatives.