Spectrum RF Plasma Generator – MKS

Spectrum® generators feature high power density, excellent stability, generous power margins and high reliability for lower cost of ownership and improved yield, wafer-to-wafer and run-to-run. The Spectrum RF generator is available in power levels of 3.0 and 1.5kW at 13.56MHz. The Spectrum RF Plasma Generator is used in Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, optical media and industrial coatings.